Imprint Process
Imprint Process - Related Videos
01:22
Imprinting
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2019
Behavioral imprinting is observed in some newborn animals and occurs when they develop strong and specific attachments to another animal (usually a parent) following brief, early-life exposures. Offspring imprint onto parents within a brief period after birth or hatching; this time window is called the critical period. Once imprinting occurs, the bond established between the parents and their offspring is usually long-lasting. Survival Mother sheep imprint onto the scent of their lambs within...
02:30
Genomic Imprinting and Inheritance
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2020
Diploid organisms inherit genetic material through chromosomes from both parents. Copies of the same gene are known as alleles. In most cases, both alleles are simultaneously expressed and allow various cellular processes to function optimally. If one of the alleles is missing or mutated, the expression of the other allele can compensate; however, this is not true for all genes. The expression of some genes depends on which parent passed the gene to the offspring, through a phenomenon known as...
09:23
Determination of DNA Methylation of Imprinted Genes in Arabidopsis Endosperm
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Cited by 4 •
2011
Imprinting is a phenomenon in plant and mammal reproduction. DNA methylation plays an important role in mechanisms of imprinting. Isolating endosperm and determining methylation status of imprinted genes in Arabidopsis can be difficult. In this protocol, we describe how to isolate endosperm and determine methylation by bisulfite sequencing.
06:14
Multiscale Structures Aggregated by Imprinted Nanofibers for Functional Surfaces
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Cited by 1 •
2018
Presented is an easy method to fabricate nano-micro multiscale structures, for functional surfaces, by aggregating nanofibers fabricated using an anodic aluminum oxide filter.
11:09
Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh
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Cited by 3 •
2017
This protocol describes a solution-based fabrication strategy for high-performance, flexible, transparent electrodes with fully-embedded, thick metal mesh. Flexible transparent electrodes fabricated by this process demonstrate among the highest reported performances, including ultra-low sheet resistance, high optical transmittance, mechanical stability under bending, strong substrate adhesion, surface smoothness, and environmental stability.
FAQs
Solidification stabilizes the replicated surface features before mold release. Heating or ultraviolet curing changes the deformable resist into a sufficiently fixed pattern, helping preserve the mold’s micro- or nanoscale geometry during separation. This step supports accurate replication and prepares the patterned resist for subsequent transfer into an underlying substrate.
Imprint processing combines high-resolution patterning with the potential for lower equipment costs than conventional lithography. Its value comes from mechanically replicating a patterned mold rather than relying only on the patterning approach associated with conventional systems. This combination makes it relevant to semiconductor manufacturing and microsystem engineering where detailed surface features are required.
Heating and ultraviolet exposure provide alternative ways to solidify the deformable resist after the mold has pressed its pattern into the material. The selected curing route therefore determines how the replicated structure becomes fixed before separation. In either case, solidification is essential for retaining micro- or nanoscale features during later processing.
The sequence begins with a patterned mold and a deformable resist. The mold is pressed into the resist, which is then solidified by heating or ultraviolet curing. After the mold separates, the resulting resist pattern can undergo subsequent processing that transfers the structure into an underlying substrate, extending the pattern into the engineered device.
Imprint processing can support fabrication of electronic components, optical elements, microfluidic structures, and other engineered surfaces. These applications rely on transferring detailed mold geometries into materials and, when needed, into an underlying substrate. The technique is therefore relevant wherever controlled micro- or nanoscale surface patterns contribute to a component’s function.
Its importance follows from the combination of precise feature replication and potentially reduced equipment costs compared with conventional lithography. The process can create patterned structures for semiconductor components and microsystems while also supporting optical and microfluidic designs. Consequently, it contributes to manufacturing approaches that require detailed engineered surfaces across multiple technology areas.